| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating film removal device which prevents a substrate from being broken or causing fire, when the substrate is charged electrostatically, and to provide a liquid-treating device equipped with the removal device. SOLUTION: A resist-coating and developing system 100 which is an embodiment has a resist-coating unit (CT) 22, having a spin chuck 41 which holes a substrate G in the horizontal state, a resist-removing unit (ER) 23 for peripheral edge above which an ionizer 62 and a filter fan unit(FFU) 61 are provided, and a transport mechanism 50, which transports the substrate G. The substrate G is destaticized, by putting ions generated by means of the ionizer 62 on a down flow from the filter fan unit(FFU) 61.
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