发明名称 PRODUCTION CONTROL SYSTEM OF SEMICONDUCTOR DEVICE, PRODUCTION CONTROL METHOD OF SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To prevent the diffusion of contaminant caused by a human error, regarding a production control for managing service conditions of a vessel for wafer transfer. SOLUTION: By a cassette usage rule processing function 66, usage rules regarding a vessel for accommodating a wafer are stored. By using a process- flow forming function 72, a process flow for verification is formed. By a process- flow check function 74, it is checked whether the process flow for verification satisfies the usage rules of a cassette. Only a flow satisfying the rules is provided to a manufacturing line. By a processing condition display function 82, the usage rules of the cassette are displayed to a line operator in each process. In the case that a cassette exchange is necessary when the process is started or ended, the exchange is indicated by a process starting function 84 or a process ending function 86.</p>
申请公布号 JP2002231594(A) 申请公布日期 2002.08.16
申请号 JP20010023178 申请日期 2001.01.31
申请人 MITSUBISHI ELECTRIC CORP 发明人 YASUDA TSUNEO
分类号 G05B19/418;G06F19/00;G06Q50/00;G06Q50/04;H01L21/02;H01L21/673;H01L21/677;H01L21/68;(IPC1-7):H01L21/02;G06F17/60 主分类号 G05B19/418
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