| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion processor which prevents unwanted particles from being irradiated on a work. SOLUTION: The ion processor has an ionizer for generating a plasma from the gas of an ion source to produce ions, a gas inlet for introducing the gas into the ionizer, an electrode group for extracting the ions produced by the ionizer therefrom and processing unit for processing a work with the extracted ions introduced therein. The ionizer contains a plasma region, where the plasma of the gas exists and a non-plasma region where no plasma exists, when a plasma is made from the gas. A diffusion late for diffusing the gas introduced via the gas inlet is disposed between the gas inlet and the plasma region. |
