| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a ceramic heater capable of uniformizing a temperature of a heating surface of a silicon wafer, and capable of preventing damage of the silicon wafer. SOLUTION: In this ceramic heater, a resistance heating element is formed on a surface or the inside of a disk-shaped ceramic substrate. The resistance heating element divided in the circumferential direction, and composed of at least two or more circuits is formed in an outer peripheral part of the ceramic substrate. A resistance heating element composed of another circuit is formed inside the resistance heating element arranged in the outer peripheral part.</p> |
