| 摘要 |
PROBLEM TO BE SOLVED: To manufacture a LSI wafer that is more closely planarized corresponding to the circuit condition of a circuit formed as a pattern on the wafer and a purpose of use of the pattern. SOLUTION: A dummy generating region 1 shown in Fig. 1 (a) is an initial region to generate a dummy cut off from an object circuit region. The region where the dummy can be physically generated is determined by searching means or the like inside the dummy generating region 1 in one cycle step for dummy generation, and then dummies 13 in the shape of a small size rectangular (or square) are generated by the number as space permits in the region. By eliminating a portion of the region incapable of generating the dummy and a portion of the minimum rectangular region (whose sides are shown by the dotted lines) including dummies 13 from the dummy generating region 1, the resultant region is passed as the dummy generating region 1 for next search cycle (shown in Fig. 1 (b)).
|
