| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus capable of restricting star-up of particle dust at the time of gas introduction into a load- lock chamber and at the time of evacuation. SOLUTION: A load-lock chamber 1 is provided with a gas introduction port 2 at the center of an upper surface 1a. The gas introduction port 2 is connected to a normal purge line 5 and a slow purge line 6 via a purge line 3 and a switch valve 4 having a pressure regulating function. Further, an exhaust port 7 is provided at four corners of a bottom surface 1b. Exhaust ports 7a, 7b, 7c, 7d provided at respective corners are disposed at outward positions of a semiconductor substrate 11 so as not to overlap the semiconductor substrate 11. Each of the exhaust ports 7a, 7b, 7c, 7d is connected to exhaust lines 8a, 8b, 8c, 8d, to be connected to an evacuating line 10 via an exhaust regulation valve 9 having the pressure regulation function. |
