发明名称 SUBSTRATE FOR GROWING NITRIDE SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide a nitride semiconductor substrate, which facilitates discrimination of a protective film from other regions on the substrate and also recognizing the protective film, after growing a nitride semiconductor layer and is expected to improve the accuracy and the efficiency in manufacturing processes of light-emitting diodes, laser elements, etc., on a substrate. SOLUTION: A nitride semiconductor layer is grown on a substrate which is dissimilar to the nitride semiconductor, a protective film having mirror properties for transmitting specified wavelength lights is formed, and a nitride semiconductor layer is formed thereon, to form a nitride semiconductor substrate of proper recognition in later steps.
申请公布号 JP2002231647(A) 申请公布日期 2002.08.16
申请号 JP20010359857 申请日期 2001.11.26
申请人 NICHIA CHEM IND LTD 发明人 MAEKAWA HITOSHI;OCHIAI MASANAO
分类号 C30B29/38;H01L21/205;H01L33/12;H01L33/30;H01L33/46;H01S5/323 主分类号 C30B29/38
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