发明名称 EXPOSURE METHOD AND ALIGNER, MASK, AND METHOD OF MANUFACTURING THE MASK
摘要 <p>PROBLEM TO BE SOLVED: To make a bar code, having a large size or complicated shape, which can be formed in a short time and with high efficiency. SOLUTION: By using a mask on which reduced codes, each of which is formed by reducing a bar code constituted by intermittently arranging a plurality of elemental codes, in accordance with a prescribed system in a direction perpendicular to the reading direction of the bar code (the arranging direction of the elemental codes) D, are formed, images Im of the reduced codes are transferred onto a substrate by exposing the images Im on the substrate several times, so that the images successively adjoin each other in the direction perpendicular to the reading direction D.</p>
申请公布号 JP2002231613(A) 申请公布日期 2002.08.16
申请号 JP20010027678 申请日期 2001.02.05
申请人 NIKON CORP 发明人 IRIE NOBUYUKI
分类号 G03F1/38;G03F1/76;G03F7/20;H01L21/027;(IPC1-7):H01L21/027;G03F1/08 主分类号 G03F1/38
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