| 摘要 |
PROBLEM TO BE SOLVED: To correctly implant ions by setting an actual angle of a platen 8, and constantly observing the angle in an end station 10 of an ion implanting device. SOLUTION: A tilt measuring device 1 to measure a tilt angle of the platen 8 by move of a float 2 is directly installed on the platen 8, so that by visually checking the float, the tilt angle of the platen can be easily set. An image pick-up element 13 to monitor move of the float is provided, so that the tilt angle of the platen can be monitored, thereby quality of ion implantation is improved.
|
