发明名称 METHOD OF MANUFACTURING NITRIDE SEMICONDUCTOR FILM
摘要 PROBLEM TO BE SOLVED: To suppress film quality change due to film deposition onto a susceptor tray, especially in the manufacturing of a nitride semiconductor film containing Al. SOLUTION: For forming a nitride semiconductor film using the MOCVD method, a susceptor tray is used, which has a plate-like base and a peripheral member removably attached to the base. A substrate is set in a recess defined by the base and the peripheral member.
申请公布号 JP2002231645(A) 申请公布日期 2002.08.16
申请号 JP20010026317 申请日期 2001.02.02
申请人 NGK INSULATORS LTD 发明人 SHIBATA TOMOHIKO;NAKAMURA YUKINORI;TANAKA MITSUHIRO;ASAI KEIICHIRO
分类号 C23C16/34;C23C16/44;C23C16/458;H01L21/205;(IPC1-7):H01L21/205 主分类号 C23C16/34
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