| 摘要 |
<p>PROBLEM TO BE SOLVED: To effectively remove dust in an exhaust gas treatment apparatus. SOLUTION: The semiconductor exhaust gas treatment apparatus (A) is constituted of an exhaust gas treating tower body (3) in which an exhaust gas cracking and treating chamber (1a) is provided, a gas supply pipe (6) which is established in the body (3), for discharging exhaust gas (F) into the chamber (1a) from the tip thereof, an electric heater member (7) which is disposed around the pipe (6), and a dust removing means (2) which is open toward a deposited dust site in the chamber (1a). An inert gas (I) is intermittently gushed out of the dust removing means (2) to the chamber (1a).</p> |
