| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive resist composition for electron beams or X-rays satisfying such characteristics as sensitivity, resolution and resist shape when electron beams or X-rays are used. SOLUTION: The positive resist composition contains (A) a compound having a disulfone group, (B) a low molecular dissolution inhibiting compound which is decomposed by the action of an acid to increase solubility in an alkali developing solution and has a molecular weight of <=3,000 and (C) an alkali-soluble resin. |
