发明名称 |
METHOD FOR MANUFACTURING FILM HAVING GOOD SURFACE SMOOTHNESS AND SEMICONDUCTIVE BELT USING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a film having good surface smoothness and a semiconductive belt using the same. SOLUTION: The method for manufacturing the film having good surface smoothness comprises the steps of molding a two-layer film having at least a body and a surface layer, and then releasing only the surface layer. The semiconductive belt uses the film formed by this method.
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申请公布号 |
JP2002225106(A) |
申请公布日期 |
2002.08.14 |
申请号 |
JP20010021200 |
申请日期 |
2001.01.30 |
申请人 |
YOKOHAMA RUBBER CO LTD:THE |
发明人 |
WATANABE JIRO;KURODA MASUO |
分类号 |
G03G15/16;B29C47/06;B29C47/08;(IPC1-7):B29C47/06 |
主分类号 |
G03G15/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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