发明名称 METHOD FOR MANUFACTURING FILM HAVING GOOD SURFACE SMOOTHNESS AND SEMICONDUCTIVE BELT USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a film having good surface smoothness and a semiconductive belt using the same. SOLUTION: The method for manufacturing the film having good surface smoothness comprises the steps of molding a two-layer film having at least a body and a surface layer, and then releasing only the surface layer. The semiconductive belt uses the film formed by this method.
申请公布号 JP2002225106(A) 申请公布日期 2002.08.14
申请号 JP20010021200 申请日期 2001.01.30
申请人 YOKOHAMA RUBBER CO LTD:THE 发明人 WATANABE JIRO;KURODA MASUO
分类号 G03G15/16;B29C47/06;B29C47/08;(IPC1-7):B29C47/06 主分类号 G03G15/16
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