发明名称 DEVICE AND METHOD FOR MANUFACTURING EXTREMELY SMOOTH GRATING
摘要 PROBLEM TO BE SOLVED: To provide a device and a method for manufacturing an extremely smooth grating stably forming a fine structure line constructing the extremely smooth grating scale used at a nanometer level or at a sub-nanometer level besides on an accurate position. SOLUTION: The device for manufacturing the extremely smooth grating is provided with a fine structure line forming function to form the fine structure line on a substrate 101 with a probe 2 of a contact mode scanning microscope and a length measuring function to measure the length of the nanometer level via the probe 2 and forms the pattern-shaped fine structure by alternately carrying out the fine structure line forming movement and the length measuring movement for the formed fine structure line.
申请公布号 JP2002228817(A) 申请公布日期 2002.08.14
申请号 JP20010020724 申请日期 2001.01.29
申请人 TOKYO INSTRUMENTS INC 发明人 NANAI SADAAKI;YOKOYAMA HIROSHI
分类号 B82B3/00;G01Q60/24;G01Q60/36;G01Q60/38;G01Q80/00;G02B5/18;H01L21/30;(IPC1-7):G02B5/18;G12B21/08 主分类号 B82B3/00
代理机构 代理人
主权项
地址