发明名称 |
DEVICE AND METHOD FOR MANUFACTURING EXTREMELY SMOOTH GRATING |
摘要 |
PROBLEM TO BE SOLVED: To provide a device and a method for manufacturing an extremely smooth grating stably forming a fine structure line constructing the extremely smooth grating scale used at a nanometer level or at a sub-nanometer level besides on an accurate position. SOLUTION: The device for manufacturing the extremely smooth grating is provided with a fine structure line forming function to form the fine structure line on a substrate 101 with a probe 2 of a contact mode scanning microscope and a length measuring function to measure the length of the nanometer level via the probe 2 and forms the pattern-shaped fine structure by alternately carrying out the fine structure line forming movement and the length measuring movement for the formed fine structure line.
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申请公布号 |
JP2002228817(A) |
申请公布日期 |
2002.08.14 |
申请号 |
JP20010020724 |
申请日期 |
2001.01.29 |
申请人 |
TOKYO INSTRUMENTS INC |
发明人 |
NANAI SADAAKI;YOKOYAMA HIROSHI |
分类号 |
B82B3/00;G01Q60/24;G01Q60/36;G01Q60/38;G01Q80/00;G02B5/18;H01L21/30;(IPC1-7):G02B5/18;G12B21/08 |
主分类号 |
B82B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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