HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a blank for a halftone phase shift mask which improves the transfer accuracy of a mask pattern and makes the inspection easy and to provide a halftone phase shift mask. SOLUTION: The blank for a halftone phase shift mask is produced by successively forming a light-shielding film 2 and a transparent film 1 on a transparent substrate 3. The refractive index of the light-shielding film at the exposure wavelength is higher than the refractive index of the transparent film.