| 摘要 |
PROBLEM TO BE SOLVED: To inexpensively provide an ultra-UV optical microscopic apparatus which can retard the generation of products on the surfaces of optical members to lower the transmittance of the optical members. SOLUTION: Only the light of the effective wavelength region of the radiation light from a light source 1 is passed through an ultra-UV illumination optical system 6 by an ultra-UV optical filter 5, is bent to an objective lens 8 side by a translucent mirror 7 and is transmitted through the objective lens 8 to illuminate an observation sample 9. The light reflected by the observation sample 9 is transmitted through the objective lens 8 and the translucent mirror 7 and is advanced to an imagery optical system composed of mirrors 11 and 13 and a lens system 12. The reflected light past the imagery optical system is imaged as an observation sample image at the focus of the imagery optical system. The optical system within a UV light observation casing 16 including all of the illumination optical system and the observation optical system can be evaded from the irradiation with the ultra-UV light by closing a shutter 4 and the contamination of the surfaces of the optical members can be retarded only by the operation to close the shutter 4 without putting off the light source each time.
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