发明名称 |
TRANSPARENT ELECTRODE FILM, AND SPUTTERING TARGET FOR DEPOSITION OF THE ELECTRODE FILM |
摘要 |
PROBLEM TO BE SOLVED: To obtain a transparent electrode film having a proper etching property, excellent visible light transmittance and high electric conductivity, and to obtain a target suppressing reduction productivity and deterioration in quality caused by the occurrence of nodules and making negligible contamination from grinding media. SOLUTION: In the transparent electrode film, 0.1-5 wt.% zirconium oxide is incorporated in indium oxide and also the zirconium oxide is allowed to enter into solid solution in the indium oxide.
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申请公布号 |
JP2002226966(A) |
申请公布日期 |
2002.08.14 |
申请号 |
JP20010025078 |
申请日期 |
2001.02.01 |
申请人 |
NIKKO MATERIALS CO LTD |
发明人 |
YAHAGI MASATAKA;YANAGII YOSHIRO;NAKAMURA ATSUSHI |
分类号 |
G02F1/1343;C23C14/08;C23C14/34;H01L21/28;H01L21/285;(IPC1-7):C23C14/08 |
主分类号 |
G02F1/1343 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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