TRANSPARENT ELECTRODE FILM, AND SPUTTERING TARGET FOR DEPOSITION OF THE ELECTRODE FILM

摘要

PROBLEM TO BE SOLVED: To obtain a transparent electrode film having a proper etching property, excellent visible light transmittance and high electric conductivity, and to obtain a target suppressing reduction productivity and deterioration in quality caused by the occurrence of nodules and making negligible contamination from grinding media. SOLUTION: In the transparent electrode film, 0.1-5 wt.% zirconium oxide is incorporated in indium oxide and also the zirconium oxide is allowed to enter into solid solution in the indium oxide.