| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method for transferring particularily a fine pattern whose line width is <=10μm in a pattern transfer apparatus, a pattern transfer method and a structure and a manufacturing method of an original plate for transfer. SOLUTION: The pattern transfer apparatus is composed of an original plate, on which the pattern is two-dimensionally formed, a medium reservoir for supplying a transferring medium to a slit for filling the medium to the pattern, a pressure adjusting structure for adjusting the pressure of the medium filled in the slit, and a substrate, on which the pattern is transferred. In this way, the pattern is transferred collectively, thereby simplifying the manufacture of electronic parts.
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