| 摘要 |
A device for deflecting a beam, having a first beam deflection unit (14) and a mirror arrangement (20) which images the deflection point (P) onto a destination point (P'). The mirror arrangement (20) is made rotationally-symmetrical over at least a certain range of deflection angles, the deflection point (P) and the destination point (P') being located on or near the axis (24) of rotational symmetry (24) of the mirror arrangement. There can be a second deflection unit (16) at the destination point (P'). Furthermore, a process for deflecting a given beam by means of rotation of the mirror surface of a planar mirror (14, 16) from a middle position involves setting the location of the axis (12, 18) of rotation of the plane mirror with respect to the planar mirror outside the mirror surface, the location of the axis of rotation with respect to the given beam being selected by determining the point at which the minimum variation of intersection points of rearward beam extensions occurs.
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