发明名称 |
Formation of thin film capacitors |
摘要 |
Thin layer capacitors are formed from a first flexible metal layer, a dielectric layer between about 0.03 and about 2 microns deposited thereon, and a second flexible metal layer deposited on the dielectric layer. The first flexible metal layer may either be a metal foil, such as a copper, aluminum, or nickel foil, or a metal layer deposited on a polymeric support sheet. Depositions of the layers is by or is facilitate by combustion chemical vapor deposition or controlled atmosphere chemical vapor deposition.
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申请公布号 |
US6433993(B1) |
申请公布日期 |
2002.08.13 |
申请号 |
US19990283100 |
申请日期 |
1999.03.31 |
申请人 |
MICROCOATING TECHNOLOGIES, INC. |
发明人 |
HUNT ANDREW T.;LIN WEN-YI;HWANG TZYY JIUAN;HENDRICK MICHELLE;HORNIS HELMUT G. |
分类号 |
H01G4/08;H05K1/16;H05K3/38;H05K3/46;(IPC1-7):H01G4/005;H01G4/228;H01G4/30;H01G4/06 |
主分类号 |
H01G4/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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