发明名称 Formation of thin film capacitors
摘要 Thin layer capacitors are formed from a first flexible metal layer, a dielectric layer between about 0.03 and about 2 microns deposited thereon, and a second flexible metal layer deposited on the dielectric layer. The first flexible metal layer may either be a metal foil, such as a copper, aluminum, or nickel foil, or a metal layer deposited on a polymeric support sheet. Depositions of the layers is by or is facilitate by combustion chemical vapor deposition or controlled atmosphere chemical vapor deposition.
申请公布号 US6433993(B1) 申请公布日期 2002.08.13
申请号 US19990283100 申请日期 1999.03.31
申请人 MICROCOATING TECHNOLOGIES, INC. 发明人 HUNT ANDREW T.;LIN WEN-YI;HWANG TZYY JIUAN;HENDRICK MICHELLE;HORNIS HELMUT G.
分类号 H01G4/08;H05K1/16;H05K3/38;H05K3/46;(IPC1-7):H01G4/005;H01G4/228;H01G4/30;H01G4/06 主分类号 H01G4/08
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