| 摘要 |
A method of processing a photographic imaging element to obtain a protective overcoat is disclosed, which overcoat provides, in the final product, resistance to fingerprints, common stains, and spills. More particularly, the present invention involves a processing-solution-permeable overcoat that becomes water and stain resistant in the photochemically processed product. The overcoat formulation comprises at least one water-dispersible hydrophobic polymer interspersed with a water-soluble polymer. During development or thereafter, before drying, the water-soluble polymer is removed to a significant extent. Subsequently, the imaged element is dried at an elevated temperature to facilitate coalescence of the overcoat to thereby provide enhanced stain resistance and water-resistance.
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