| 摘要 |
contact lithography. SUBSTANCE: lithographer has soft X-raying source 1, hemilens 2, mask 3, substrate 4 carrying resist 5, and absorption filter 6. Source 1 is to be preferably made in the form of revolving-anode X-ray tube. Hemilens 2 has plurality of full-external-reflection radiation transport channels positioned over generating lines of barrel-shaped surfaces. Hemilens functions to convert diverging rays of source 1 into quasi-parallel ones. Means for disposing mask 3 and substrate 4 are located on output end of hemilens, Absorption filter functions to smoothly vary intensity of hemilens output radiation beam. Filter is mounted between source 1 and input end of hemilens. Proportion between transverse dimensions of hemilens and its focal length on input end is chosen to ensure source radiation trapping angle within following range: 0,7/E1,5<= ψ <= 1,3/E1,5, where ψ is radiation trapping angle, rad; E is radiation energy of source employed, keV. Reflecting surface of radiation transport channels is made of material incorporating elements with atomic number of maximum 22. Radiation energy of source 1 is 0.6 to 6 keV. EFFECT: enhanced efficiency of radiation source used, enlarged surface area of planar substrate being treated, extended life of lens. 2 cl, 2 dwg
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