PHASE SHIFT MASK AND PATTERN FORMING METHOD USING THE SAME

摘要

PURPOSE: To provide a Levenson type phase shift mask in which increase in the dimension of the formable minimum pattern element due to the proximity effect of light can be effectively suppressed. CONSTITUTION: A light-shielding part 22a to form an isolated pattern element and a plurality of light-shielding parts 22b to form a periodical pattern element are formed on a light-transmitting substrate 21. A phase shift part 23a and a light-transmitting part 24a are arranged in both sides of the light-shielding part 22a, and a phase shift part 23b and a light-transmitting part 24b are arranged in both sides of each light-shielding part 22b. The residual part of the light-transmitting substrate 21 is covered with a light-shielding part 22c. The width Wp1 of the phase shift part 23a is made almost equal to the width Wp2 of the phase shift part 23b.