| 摘要 |
PROBLEM TO BE SOLVED: To reduce potential difference applied to the surface and backside of a substrate. SOLUTION: The plasma treatment device has a continuity means 45 for guiding a DC voltage that is generated at an ion sheath when plasma is excited to a first electrode 31 where a substrate W is placed. As a result, the DC voltage is applied to both surface and backsides of the substrate W, thus setting both the surfaces of the substrate to the same potential, thus preventing an element from being damaged due to the generation of large potential difference on both the surfaces of the substrate W. |
