| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate treating device for treating a substrate uniformly by rotating the substrate in treatment liquid without generating any particles. SOLUTION: A roller 40a (40b) is a cylindrical body that is arranged in parallel with the bottom surface of a treatment bath 10, and supports a plurality of substrates W while the main surface is oriented in the vertical direction. The roller 40a is not in contact with the treatment bath 10 in terms of the diametric direction due to the repulsive force of cylindrical magnets 41 and 44, and annular magnets 42 and 45. Also, the roller 40a is not in contact with the treatment bath 10 in terms of the longitudinal direction due to the repulsive force of the annular magnets 42 and 45 and the annular magnets 43 and 46. Further, rotary drive force is transmitted from a drive force transmission shaft 51a to the roller 40a without any contact due to the attraction between a cylindrical drive magnet 47 and an annular drive magnet 48, thus rotating the roller 40a without being in contact with the treatment bath 10.</p> |
