ALIGNER, SYSTEM AND METHOD FOR EXPOSURE

摘要

PROBLEM TO BE SOLVED: To provide an aligner and a system for exposure enabling easier definition of an optimum operating parameter depending on production modes. SOLUTION: The system exposing a mask pattern on a substrate is provided with a memory 20 storing a number of operating parameters for exposure- related processing and a controller 14 switching the operating parameters based on the time slot for processing. It also is provided with a setting section containing a plurality of the aligners to set any operating parameter for plural memories in the lump.