EXPOSURE APPARATUS, METHOD OF MANUFACTURING DEVICE, AND DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus that is high in overlay accuracy and to provide a method of manufacturing device using the exposure optical system of the exposure apparatus. SOLUTION: The exposure apparatus has the optical illumination system which illuminates a surface to be illuminated on which a prescribed pattern is formed, and a projection optical system which projects the pattern upon a workpiece to be treated and has a telecentric structure on the workpiece side. The optical illumination system has a function of adjusting the inclination of the principal ray of light. The exposure apparatus is constituted in such a way that the system projects the pattern upon the workpiece by only using the off-axis image forming area of the projection optical system and the optical axis of the optical illumination system is coaxial with the optical axis of the projection optical system.