发明名称 SEMICONDUCTOR DEVICE, NONVOLATILE SEMICONDUCTOR MEMORY, AND ITS MANUFACTURING METHOD
摘要 PURPOSE: To provide a semiconductor device having a semiconductor element which is capable of reducing manufacturing costs by simplifying manufacturing processes and which is capable of controlling high voltage current. CONSTITUTION: In a semiconductor device comprising a first and second semiconductor element, the first semiconductor element includes lower electrodes 13ba, 13bb, 13bc, 13bd, 13ab, 13cb that are formed on a substrate 1, an intermediate insulating film 15 that is formed on the lower electrodes, and upper part electrodes 16a to 16d that are formed on the insulating film 15. The second semiconductor elements 26, 27 are formed on the substrate 1 and include a gate insulating film 15 composed of the same layer as the intermediate insulating film 15 and gate electrodes 16e, 16f that are formed on the gate insulating film 15.
申请公布号 KR20020064636(A) 申请公布日期 2002.08.09
申请号 KR20010061364 申请日期 2001.10.05
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 NISHIOKA NAHO
分类号 H01L21/8247;H01L27/10;H01L27/105;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L27/115 主分类号 H01L21/8247
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