发明名称 FLUORINE MOLECULAR LASER APPARATUS AND FLUORINE EXPOSURE APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a fluorine molecular laser apparatus and a fluorine exposure apparatus that can estimate a spectrum characteristic with high accuracy by simple means and can control it within an allowable range. SOLUTION: The fluorine molecular laser apparatus produces main discharge 26 in a laser chamber 2 in which a laser gas containing fluorine is packed to generate fluorine molecular laser light 11. The gas pressure P of the laser gas in the laser chamber 2 is detected and a pressure range (Pm-PM) of the gas pressure P is set, in such a way that the spectrum characteristic is within the allowable range based on the relationship between the spectrum characteristic of the fluorine molecular laser light 11 and the gas pressure P. The gas pressure P is controlled within the pressure range (Pm-PM).
申请公布号 JP2002223020(A) 申请公布日期 2002.08.09
申请号 JP20010017838 申请日期 2001.01.26
申请人 GIGAPHOTON INC 发明人 NAGAI SHINJI;WAKABAYASHI OSAMU
分类号 G03F7/20;H01L21/027;H01S3/036;H01S3/104;H01S3/223;(IPC1-7):H01S3/104 主分类号 G03F7/20
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