| 摘要 |
PROBLEM TO BE SOLVED: To provide a new polysiloxane useful as a resin component for a resist material and the like, excellent in dry-etching resistance, and also excellent in basic properties as the resist such as transparency, sensibility, resolution and development to radiation. SOLUTION: The polysiloxane is composed of a structural unit (I) and/or the structural unit (II), expressed by the following general formula (1), wherein a weight-average molecular weight reduced to polystylene is 500-1,000,000. [Formula (1), each R denotes a hydrogen atom or a methyl group, independently each other, R' denotes a hydrogen atom, monovalent hydrocarbon group, monovalent hydrocarbon-halide group, halogen atom or primary to tertiary amino group, and n is an integer of 1-3]. |
