发明名称 SPUTTERING TARGET FOR OPTICAL DISK AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide an easily discharged target for an optical disk, consisting of chalcogenide based elements and Ag as main components, and a manufacturing method therefor. SOLUTION: The sputtering target includes two kinds of chalcogen elements, Sb and Te, and Ag, as indispensable elements, and is characterized by that a part or all of Ag exists in dispersed condition in the target without being combined with other elements.
申请公布号 JP2002220658(A) 申请公布日期 2002.08.09
申请号 JP20010019313 申请日期 2001.01.26
申请人 RICOH CO LTD 发明人 ONAKI NOBUAKI;SHIBATA KIYOTO;MAGAI MASARU;DEGUCHI KOJI;ITO KAZUNORI
分类号 B41M5/26;B22F9/04;C22C1/04;C22C12/00;C23C14/34;G11B7/24;G11B7/243;G11B7/26 主分类号 B41M5/26
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