| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemically-sensitized positive type photoresist composition with both its developing faulty performance and line edge roughness simultaneously-improved. SOLUTION: The positive type photoresist composition is provided with (A) a compound generating acid by irradiation of an active light ray or a radial ray and (B) a resin insoluble or hardly soluble for alkali, dissolved by action of acid to increase its solubility in an alkali developer. It is characterized in that the resin of (B) comprises a mixture of at least two types of resins (B1) and (B2) to satisfy the following formula: 9.9>=(B1M)/(B2M)>=1.3 where: (B1M) = dispersity of (B1): Mw (B2M) = dispersity of (B2): Mn. |
