发明名称 SEMICONDUCTOR EXPOSURE SYSTEM AND SEMICONDUCTOR EXPOSURE METHOD USING THE SAME
摘要 PURPOSE: A semiconductor exposure system is provided to effectively perform wafer focusing and leveling by separating the wafer focusing and leveling from a wafer exposure. CONSTITUTION: A semiconductor exposure system(100) comprises a loader part, a pre-align part(130), an exposure part(150), an unloader part, a transfer part including a transfer arm for transferring a wafer to a defined portion and a driving part for supporting the semiconductor exposure system(100) driving. The pre-align part(130) further includes a focusing leveling part(132) and a wafer align part(138). The exposure part(150) further includes a correction part(154) and an exposure apparatus(156). At this point, a data line(10) and a control line(30) are respectively connected with the pre-align part(130) and the exposure part(150).
申请公布号 KR20020064453(A) 申请公布日期 2002.08.09
申请号 KR20010004909 申请日期 2001.02.01
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, SEONG HYEON
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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