发明名称 PLASMA INSTALLATION AND METHOD FOR PRODUCING A FUNCTIONAL COATING
摘要 The invention relates to a plasma installation comprising at least one inductively coupled high frequency plasma jet source (5) having a burner body (25) defining a plasma producing chamber (27) and having an outlet for the plasma jet (20), in addition to a chamber (40) which is connected to the plasma jet source (5) by means of the outlet (26), and which contains a substrate (19) which is exposed to the plasma jet (20). Said substrate (19) is arranged on a substrate electrode (18) which can be subjected to an electric voltage. The invention also relates to a method for producing a functional coating on the substrate (19) using one such plasma installation. In a preferred embodiment, during the operation of the plasma installation, both the plasma jet (21) and the electrical voltage applied to the substrate electrode (18) are pulsed, and/or a pressure drop is maintained between the inside of the plasma jet source (5) and the inside of the chamber (40), in the direction of the plasma jet source to the chamber.
申请公布号 WO02062115(A1) 申请公布日期 2002.08.08
申请号 WO2001DE04565 申请日期 2001.12.05
申请人 ROBERT BOSCH GMBH;GROSSE, STEFAN;HENKE, SASCHA;SPINDLER, SUSANNE 发明人 GROSSE, STEFAN;HENKE, SASCHA;SPINDLER, SUSANNE
分类号 H05H1/46;B01J19/08;C23C16/507;C23C16/513;C23C16/515;H01J37/32;H01L21/205;H05H1/24;H05H1/30 主分类号 H05H1/46
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