发明名称 Electrocoating process to form a dielectric layer in an organic substrate to reduce loop inductance
摘要 The present invention includes forming a thin, conformal, high-integrity dielectric coating between conductive layers in a via-in-via structure in an organic substrate using an electrocoating process to reduce loop inductance between the conductive layers. The dielectric coating is formed using a high dielectric constant material such as organic polymers and organic polymer mixtures. The present invention also includes forming a thin, dielectric coating between conductive layers on a substantially planar substrate material and an embedded capacitor to reduce loop inductance.
申请公布号 US2002105774(A1) 申请公布日期 2002.08.08
申请号 US20000733484 申请日期 2000.12.08
申请人 INTEL CORPORATION 发明人 WERMER PAUL H.;KAISER BRIAN
分类号 H05K1/11;H05K1/16;H05K3/40;H05K3/42;(IPC1-7):H01G4/06 主分类号 H05K1/11
代理机构 代理人
主权项
地址