| 摘要 |
<p>A method and a device for forming film and a method of manufacturing an optical element; the device, wherein a substrate holder (2) is installed in a vacuum chamber (1) and rotated around a rotating shaft (3), optical elements (4) to be film-formed thereon are installed on the lower surface of the substrate holder (2) on a circle concentric to the rotating shaft, and a monitor substrate (5) is installed at one of the positions for installing the optical elements (4); the method, comprising the steps of measuring the film thickness of the substrate (5) to estimate the film thickness formed on the optical elements (4), wherein, since the film thickness on the monitor substrate (5) is increased and a measuring accuracy is deteriorated when a film formation is advanced and the film thickness formed on the optical elements (4) is increased, the film formation is performed while replacing the monitor substrate (5) with a new one in the series of film forming steps, whereby the deterioration of the film thickness measuring accuracy can be prevented, and the optical element with a specified performance can be manufactured.</p> |
