发明名称 |
POLISHING FILM AND METHOD FOR MANUFACTURE THEREOF |
摘要 |
A polishing film (10) which comprises a plastic film (11) and, formed on the surface thereof, a polishing layer (14) having a thickness of 50 mu m or more and comprising 50 to 85 wt % of silica particles having been treated with heat at 100 to 400 DEG C for 4 to 48 hours and a binder resin (13) for fixing the particles.
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申请公布号 |
WO02060648(A1) |
申请公布日期 |
2002.08.08 |
申请号 |
WO2001JP10401 |
申请日期 |
2001.11.28 |
申请人 |
NIHON MICRO COATING CO., LTD.;OHNO, HISATOMO;IZUMI, TOSHIHIRO |
发明人 |
OHNO, HISATOMO;IZUMI, TOSHIHIRO |
分类号 |
B05D7/04;B05D7/24;B24D3/00;B24D3/28;B24D11/00;C03C19/00;C08J5/14;C08J7/04;C09C1/68;C09K3/14;(IPC1-7):B24D11/00 |
主分类号 |
B05D7/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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