| 摘要 |
<p>An electron beam exposure device for exposing a pattern to a wafer by a plurality of electron beams, comprising an electron beam generating part for generating the plurality of electron beams and a first electron lens part for independently condensing the plurality of electric beams, the first electron lens part further comprising a first magnetic conductor part having a plurality of first lens opening parts for passing the plurality of electron beams therethrough, a first coil part installed around the first magnetic conductor part and generating a magnetic field at the plurality of first lens opening parts, and a first cooling part installed adjacent to the first coil part and cooling the first coil part.</p> |
