发明名称 |
Semiconductor device and method of manufacturing the same |
摘要 |
To increase the withstand voltage and reduce ON-state resistance, a semiconductor device provided with a gate electrode formed on a semiconductor substrate via a gate insulating film, an LP layer (a P-type body region) formed so that the LP layer is adjacent to the gate electrode, an N-type source region and a channel region respectively formed in the LP layer, an N-type drain region formed in a position apart from the LP layer and an LN layer (a drift region) formed so that the LN layer surrounds the drain region is characterized in that the LP layer is formed up to the side of the drain region through an active region under the gate electrode and an SLN layer is formed from the drain region to a part before the active region.
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申请公布号 |
US2002106860(A1) |
申请公布日期 |
2002.08.08 |
申请号 |
US20020039830 |
申请日期 |
2002.01.04 |
申请人 |
SANYO ELECTRIC CO., LTD., A JAPAN CORPORATION |
发明人 |
NISHIBE EIJI;KIKUCHI SHUICHI;MARUYAMA TAKAO |
分类号 |
H01L21/265;H01L21/336;H01L29/08;H01L29/10;H01L29/423;H01L29/78;(IPC1-7):H01L21/336 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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