发明名称 Method and apparatus for supplying gas used in semiconductor processing
摘要 A method and apparatus for uniformly supplying a gas into a chamber through a dispersion head. The gas is introduced through an inlet of the dispersion head, and flows in a flow direction toward a first diffuser arranged in the dispersion head. The gas is diffused a first time within the dispersion head by dispersing the gas along side directions different than the flow direction by contacting the gas and the first diffuser. A portion of the first diffused gas is guided through an outlet of the dispersion head and toward a work piece arranged in a chamber. A remaining portion of the first diffused gas is diffused a second time by contacting the gas and a second diffuser disposed between the first diffuser and the work piece, by dispersing the gas along side directions different than the flow direction. A portion of the twice diffused gas is guided through the outlet of the dispersion head and toward the work piece arranged in the chamber.
申请公布号 US2002104617(A1) 申请公布日期 2002.08.08
申请号 US20020059209 申请日期 2002.01.31
申请人 KIM JEONG-JU 发明人 KIM JEONG-JU
分类号 C23C16/44;C23C16/455;H01J37/32;H01L21/00;H01L21/205;H01L21/302;(IPC1-7):C23C16/00;C23F1/00;H05H1/24;H01L21/31 主分类号 C23C16/44
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