CLEANING AND SURFACE PROCESSING APPARATUS USING PULSE-TYPE UV IRRADIATION

摘要

PURPOSE: A cleaning and surface processing apparatus is provided to improve a through-put by simultaneously using pulse-type UV(Ultra-Violet) rays having high energy, high density plasma and RF(Radio Frequency) plasma instead of general UV rays. CONSTITUTION: A pulse-type high power generated from a pulse generator is supplied through a feed through(102) and an UV lamp(103) in order to provide UV rays to a main chamber(101). A reflection panel(104) is installed to enclose the upper portion of the UV lamp(103) so as to equally irradiate the emitted UV rays from the UV lamp(103) to a substrate direction. An ozone generated from an ozone generator(107) for cleaning or a surface processing of a substrate(112) is injected into the main chamber(101) through a gas supply line(118) from a valve(106). At this time, the injected ozone has a strong oxidizing power by absorbing light energy of the UV rays, thereby cleaning the substrate(112).