发明名称 APPARATUS AND METHOD FOR COATING AND SURFACE TREATMENT USING SINGLE SOURCE
摘要 PURPOSE: An apparatus and a method for coating and surface treatment using a single source are provided which enable coating and surface treatment on all solid phase metals and insulating materials at ordinary temperature using the single source. CONSTITUTION: The apparatus for coating and surface treatment using a single source comprises a laser(1) generating laser light; a light assembly(2) for focusing and scanning the laser light generated by the laser(1); a target(7) which is an evaporation source of plasma generated by the laser light; a target holder(9) on which the target(7) is mounted; a high voltage pulse generation part(5) supplying high voltage of pulse mode to the target(7); a high voltage feedthrough(6) supplying the high voltage pulse outputted from the high voltage pulse generation part(5) to the target(7); a matrix(8) which is an object for coating and surface reforming using plasma of the target(7) generated by the laser light of the pulse mode that is generated by the laser(1); a matrix holder(10) on which the matrix(8) is mounted; a vacuum chamber(4) maintaining certain degrees of vacuum as containing the target(7), target holder(9), matrix(8) and matrix holder(10) in the vacuum chamber(4); and a vacuum system constantly maintaining a degree of vacuum of the vacuum chamber(4).
申请公布号 KR20020064064(A) 申请公布日期 2002.08.07
申请号 KR20010004666 申请日期 2001.01.31
申请人 KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 KIM, SUN GWANG;KIM, WON MOK
分类号 C23C14/28;C23C14/00;H01L21/285;(IPC1-7):C23C14/00 主分类号 C23C14/28
代理机构 代理人
主权项
地址