发明名称 |
APPARATUS AND METHOD FOR COATING AND SURFACE TREATMENT USING SINGLE SOURCE |
摘要 |
PURPOSE: An apparatus and a method for coating and surface treatment using a single source are provided which enable coating and surface treatment on all solid phase metals and insulating materials at ordinary temperature using the single source. CONSTITUTION: The apparatus for coating and surface treatment using a single source comprises a laser(1) generating laser light; a light assembly(2) for focusing and scanning the laser light generated by the laser(1); a target(7) which is an evaporation source of plasma generated by the laser light; a target holder(9) on which the target(7) is mounted; a high voltage pulse generation part(5) supplying high voltage of pulse mode to the target(7); a high voltage feedthrough(6) supplying the high voltage pulse outputted from the high voltage pulse generation part(5) to the target(7); a matrix(8) which is an object for coating and surface reforming using plasma of the target(7) generated by the laser light of the pulse mode that is generated by the laser(1); a matrix holder(10) on which the matrix(8) is mounted; a vacuum chamber(4) maintaining certain degrees of vacuum as containing the target(7), target holder(9), matrix(8) and matrix holder(10) in the vacuum chamber(4); and a vacuum system constantly maintaining a degree of vacuum of the vacuum chamber(4).
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申请公布号 |
KR20020064064(A) |
申请公布日期 |
2002.08.07 |
申请号 |
KR20010004666 |
申请日期 |
2001.01.31 |
申请人 |
KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
KIM, SUN GWANG;KIM, WON MOK |
分类号 |
C23C14/28;C23C14/00;H01L21/285;(IPC1-7):C23C14/00 |
主分类号 |
C23C14/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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