Lithography apparatus, lithography method and method of manufacturing master print for transfer

摘要

The invention relates to a lithographic apparatus for transferring a fine pattern having a line width less than 10 mu m, a lithographic method, a structure for and a method of manufacturing an original master for transfer. The lithographic apparatus comprising an original master (103) on which a pattern is formed within a two-dimensional plane, a slit (804; 2301) for filling a medium (805; 2903) in the pattern, a medium sump (104; 2901) for feeding the medium, a pressure regulating mechanism (904; 2906) for adjusting the pressure of the medium filled in the slit, and a lithographic substrate (102). With this apparatus, the pattern can be batch-transferred, thereby making it possible to easily manufacture electronic parts. <IMAGE> <IMAGE>