发明名称 Electron beam irradiating apparatus having cathode plate formed of non-metal conductive material
摘要 An electron beam irradiating apparatus adopting a cathode plate including a non-metal conductive material. The electron beam irradiating apparatus includes a chamber having an opening at the top thereof, a cathode plate disposed to cover the opening of the chamber, a susceptor disposed on the inner bottom surface of the chamber, a grid plate disposed between the cathode plate and the susceptor, and a gas injection ring disposed below the grid plate. The cathode plate and the chamber are electrically insulated from each other, and the grid plate is electrically insulated from the chamber and the cathode plate. The cathode plate may be a single plate formed of the non-metal conductive material alone or a double cathode plate in which at least a lower surface thereof, facing the bottom surface of the chamber, is formed of a non-metal conductive material. When electrons are emitted from the cathode plate by applying a predetermined voltage to the cathode and grid plates, simultaneous emission of metal atoms from the cathode plate can be eliminated.
申请公布号 US6429445(B1) 申请公布日期 2002.08.06
申请号 US20000639833 申请日期 2000.08.16
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM SEONG-HO;KIM SUNG-JIN;LEE HAE-JEONG
分类号 G21K5/00;G03F7/20;H01J37/075;H01J37/32;H01L21/027;H01L21/31;H01L21/312;H01L21/316;H01L21/768;(IPC1-7):G21G5/00;A61N5/00;C23C14/00 主分类号 G21K5/00
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