发明名称 |
SUBSTRATE TREATMENT DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment device capable of maintaining opening and closing conditions of a block member (shutter member). SOLUTION: While a rod 321 of an air cylinder 32 is buried in a main body 322, a shutter plate 39 adheres closely to a seal member 12 to block a substrate passing port 11. When the rod 321 of the air cylinder 32 is made to advance from the main body 322 and an end part 351 of a lever 35 is pushed up, an L-shaped member 38 rotates counterclockwise in the drawing 2, and the shutter plate 39 leaves the substrate passing port 11 to open the substrate passing port 11. A metallic balancer 4 for generating a moment for maintaining opening and closing conditions of the substrate passing port 11 in the L-shaped member 38 is embedded in the L-shaped member 38. |
申请公布号 |
JP2002220114(A) |
申请公布日期 |
2002.08.06 |
申请号 |
JP20010017381 |
申请日期 |
2001.01.25 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
TANI NOBUO;KOYAMA YOSHIHIRO;WATANABE JUN |
分类号 |
B65G49/00;B05C11/08;B05C15/00;H01L21/306;H01L21/677;H01L21/68;(IPC1-7):B65G49/00 |
主分类号 |
B65G49/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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