发明名称 SUBSTRATE TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate treatment device capable of maintaining opening and closing conditions of a block member (shutter member). SOLUTION: While a rod 321 of an air cylinder 32 is buried in a main body 322, a shutter plate 39 adheres closely to a seal member 12 to block a substrate passing port 11. When the rod 321 of the air cylinder 32 is made to advance from the main body 322 and an end part 351 of a lever 35 is pushed up, an L-shaped member 38 rotates counterclockwise in the drawing 2, and the shutter plate 39 leaves the substrate passing port 11 to open the substrate passing port 11. A metallic balancer 4 for generating a moment for maintaining opening and closing conditions of the substrate passing port 11 in the L-shaped member 38 is embedded in the L-shaped member 38.
申请公布号 JP2002220114(A) 申请公布日期 2002.08.06
申请号 JP20010017381 申请日期 2001.01.25
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 TANI NOBUO;KOYAMA YOSHIHIRO;WATANABE JUN
分类号 B65G49/00;B05C11/08;B05C15/00;H01L21/306;H01L21/677;H01L21/68;(IPC1-7):B65G49/00 主分类号 B65G49/00
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