| 摘要 |
Workpieces requiring low levels of contamination, such as semiconductor wafers, are loaded into a workpiece support or holder within a process chamber. The process chamber has a drain opening, slot or edge. The chamber is closed via a door. A process or rinsing liquid is introduced into the chamber. The liquid rises to a level so that the workpieces are immersed in the liquid. The chamber slowly pivots or rotates to move the drain opening down to the level of the liquid. The liquid drains out through the drain opening. The drain opening is kept near the surface of the liquid to drain off liquid at a uniform rate. An organic solvent vapor is introduced above the liquid to reduce or prevent droplets of liquid from remaining on the workpieces as the liquid drains off. An outer chamber may be provided around the process chamber to provide increased control of the process environment.
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