Method for forming a calibation standard to adjust a micro-bar of an electron microscope

摘要

The invention relates to a method for adjusting a micro-bar of an electron microscope to increase the accuracy of the micro-bar. The method entails first forming a photo-resist layer on a semiconductor wafer, and exposing a predetermined region of the photo-resist layer to a light of a specific wavelength. Then, a resist stripping process is performed to remove the photo-resist layer in the predetermined region. The periphery of the predetermined region of the photo-resist layer will form a vertical side wall with a periodic wave shape similar to a sine wave, and the wavelength of the periodic wave shape is determined by the wavelength of the light and the refraction rate of the photo-resist layer. Finally, the micro-bar of the electron microscope is adjusted using the wavelength of the periodic wave shape on the vertical side wall.