| 发明名称 |
Method and apparatus that compensates for phase shift mask manufacturing defects |
| 摘要 |
An apparatus is described comprising a phase shift mask having a transparent region. The transparent region comprises an etched region of a transparent layer. The etched region has a final etch depth that corresponds to a designed for phase shift and the designed for phase shift is greater than 180°.
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| 申请公布号 |
US6428936(B1) |
申请公布日期 |
2002.08.06 |
| 申请号 |
US19990465520 |
申请日期 |
1999.12.16 |
| 申请人 |
INTEL CORPORATION |
发明人 |
SCHENKER RICHARD E. |
| 分类号 |
G03F1/00;(IPC1-7):G03F9/00;G03C5/00 |
主分类号 |
G03F1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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