| 摘要 |
PURPOSE: Provided are an asymmetric beta-ketoiminate ligand compound excellent in vaporization property, heat and chemical stability, and solubility for organic solvents and an organic metal precursor, containing the asymmetric beta-ketoiminate ligand compound, for chemical vapor deposition. CONSTITUTION: The asymmetric beta-ketoiminate ligand compound(formula 4) is produced by reacting an alpha, beta-yne-one compound(formula 1) and a primary amine compound(formula 2: R3X-R'-NH2) or a secondary amine compound(formula 3: (R3X-R')2-NH), wherein R1 is C1-C8 linear or branched alkyl, R2 is C2-C9 linear or branched alkyl, the carbon number of R2 is more than R1, R' is C1-C8 linear or branched alkylene or a hydrocarbon containing one to three ethylene ether or propylene ether, R3 is hydrogen atom or C1-C9 linear or branched alkyl, and X is oxygen or sulfur. And the organic metal precursor is produced by reacting the asymmetric beta-ketoiminate ligand compound(formula 4) with a metal such as Ti, Zr, or Hf.
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