METHOD FOR MANUFACTURING SEMICONDUCTOR, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL ELECTROOPTICAL DEVICE

摘要

PURPOSE: To obtain a crystallization silicon film which is formed on a glass substrate and has a uniform crystallizability within a substrate surface and to flatten the substrate. CONSTITUTION: When applying line-shaped laser beams to an amorphous silicon film formed on a glass substrate during scanning, the glass substrate is installed so that a projecting curved surface is exposed and line-shaped laser beams with a focus distribution in inverse U shape nearly corresponding to the projecting curved surface in heated state are applied during scanning before gradual cooling.